 Worldwide | All Peter's ads | Member #155174 | Status: Unverified | Since: March 2008 |
UPGRADED TEGAL 901E FOR PLASMA ETCHER
Tegal 900 series Plasma/RIE etch System are used by the Semiconductor Industry for integrated circuit fabrication. The system are used in one part of the sequence of manufacturing steps that transfer a pattern formed from a layer of photosensitive material, the photoresist, to a layer that makes up a permanent part of the final device. The process of defining a ... »
4.7.2008 / Peter (Santa Clara, California)
Tel: 408-988-5188 Send e-mail Website  |
UPGRADED MATRIX 105 FOR PLASMA ASHER/DESCUM
Matrix 105 provides high throughput in a single wafer system capable of handling wide variety of substrates, including round, square and ranging from 3” up to 6”. By maintaining independent closed-loop system controls, the system optimizes vital device parameters.
Combined with Allwin21 Corp advanced Robot control technology , AW Control Software and Superior Temperature Control Technology , upgraded Matrix 105 provides significant ... »
4.7.2008 / Peter (Santa Clara, California)
Tel: 408-988-5188 Send e-mail Website |
UPGRADED GASONICS AURA1000 FOR PLASMA ASHER
Download Upgraded GaSonic Aura 1000 Technical Documents
Download Upgraded Gasonics Aura 1000 Special Features
GaSonic Aura 1000 Plasma System is the microprocessor controlled down-stream, or “ afterglow” photoresist stripper that will strip the front and backside of a wafer, typically in less than one minute. The unit is fully automated, cassette-to-cassette, and is a single-wafer process design.
Combined ... »
4.7.2008 / Peter (Santa Clara, California)
Tel: 408-988-5188 Send e-mail Website |
PLASMA ETCH/ETCHING/DRY ETCH
Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module, and every wafer undergoes many etching steps before it is complete.
If the etch is intended to make a cavity in a material, the depth of the cavity may be controlled approximately using the etching time and ... »
4.7.2008 / Peter (Santa Clara, California)
Tel: 408-988-5188 Send e-mail Website |
PLASMA ASHER STRIPPER DESCUM
In semiconductor manufacturing plasma asher/stripper is the process of removing the photoresist from an etched wafer. Using a plasma source, a monatomic reactive species is generated. Oxygen or fluorine are the most common reactive species. The reactive species combines with the photoresist to form ashing which is removed with a vacuum pump.
Typically, monatomic (single atom) oxygen plasma is created ... »
4.7.2008 / Peter (Santa Clara, California)
Tel: 408-988-5188 Send e-mail Website |
RAPID THERMAL PROCESS
AW Control Software provides the unique upgrade system for all our main products. The advantages of the upgraded systems include:
Integrated process control system
Real time graphics display
Real time process data acquisition, display, and analysis
Programmed comprehensive calibration and diagnostic functions
Better performance and maintenance than the original systems
Rapid thermal processing (or RTP) refers to a semiconductor manufacturing process ... »
4.7.2008 / Peter (Santa Clara, California)
Tel: 408-988-5188 Send e-mail Website |
ACCUTHERMO AW 610 FOR RAPID THERMAL PROCESS FROM ALLWIN
Allwin21 has already bought the exclusive manufacture license for AG Heatpulse 610, AG Heatpulse 410, AG Heatpulse 210.Allwin21 is making new AG 610 machine with her AW Control Software and Superior Temperature Control Technology . The brand new system is named of AccuThermo AW 610.Allwin21 Corp is providing the exclusive licensed technical service for all the AG Heatpulse 210/410 ... »
3.23.2008 / Peter (Santa Clara, California)
Tel: 408-988-5188 Send e-mail Website |
GASONICS AURA 3010 FOR PLASMA ASHER FROM ALLWIN21 CORP
The Aura 3010(Aura3000) is a single-wafer downstream photoresist asher, delivers high ash rates with low damage, a large process window, and a choice of process temperatures during the ashing process. The system has a user friendly menu-driven user interface, and is suitable for automation via SMIF (Standard Mechanical Interface) or AGV (Automated Guided Vehicle).
Combined with Allwin21 Corp ... »
3.23.2008 / Peter (Santa Clara, California)
Tel: 408-988-5188 Send e-mail Website |
BRANSON IPC 3000 FOR PLASMA ASHER FROM ALLWIN21 CORP
Fully Refurbished and upgraded BRANSON/IPC - 3000
Low Temperature Plasma Asher.
Quartz reaction chamber(Consumable parts).
1000W 13.56 MHz ENI RF generator(Consumable parts)
4” quartz boat(Consumable parts)—It can also be 6”.
Single gas line with One Used MFC (Consumable parts)
Computer with touch screen.
Monitor with keyboard, mouse.
AW-2000 software with new controller for Branson/IPC ... »
3.23.2008 / Peter (Santa Clara, California)
Tel: 408-988-5188 Send e-mail |
GASONICS AURA 2000LL FROM ALLWIN21 CORP
8" Cassette to Cassette , Single Wafer Downstream Microwave Asher w/ Loadlock. GaSonics Aura 2000LL Asher Downstream microwave source and a dictated reactor chamber ,8" Cassette to Cassette , Single Wafer Asher , Configured for 4" - 8" wafers Customer to Specify. Loadlock with cool-down station for processed wafer Gas box, designed to hold 4 MFC's capability (System includes 2 MFC's calibrated ... »
3.23.2008 / Peter (Santa Clara, California)
Tel: 408-988-5188 Send e-mail Website |
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