| Tegal 900 series Plasma/RIE etch System are used by the Semiconductor Industry for integrated circuit fabrication. The system are used in one part of the sequence of manufacturing steps that transfer a pattern formed from a layer of photosensitive material, the photoresist, to a layer that makes up a permanent part of the final device. The process of defining a pattern with photoresist known as photolithography, while the etch process transfers the photoresist pattern to the permanent layer.The 900 Series systems deliver highly reliable, repeatable results in etching a variety of films used to manufacture semiconductor, telecommunications and optoelectronics devices, flat panel displays and thin film magnetic heads.
Upgraded Tegal 901e system is designed around a production-proven wafer transport design that can accommodate 75 mm to 150 mm round silicon, GaAs, InP, and dielectric material substrates. The transport can also be configured to accommodate rectangular substrates up to 125 mm on a side.
Combined with Allwin21 Corp AW Control Software , upgraded Tegal901e provides significant advantages over the original systems.
Single Wafer, Multi-Step Processing
Closed-Loop Temperature Control
Pressure Control
Accurate, closed-loop pressure control with “butterfly-style” throttle valve and capacitance manometer
New hardware includes: New control Board with cable, new timer counter with watch dog, Pentium Computer with 17” LCD Monitor, standard keyboard and mouse.
Software calibration and easy to be done.
More functions and I/O hardware “exposed” for easier maintenance and trouble shooting.
It is easy to edit recipe with GUI and graph display.
Save all process data on the computer hard disk.
A/D and D/A precision is 14 to 16 bits.
Detect in process and with color curve displayed on the screen.
Robot teach is on the GUI and easy to do the procedure with new concept teaching method.
Software watch dog to eliminate machine damage duo to the computer locks up or freeze.
Sensor status detect function.
On line help function
Better performance and maintenance than the original systems
Upgraded Tegal 901e Applications
nitride etch,
photoresist Descum,
polyimide and BCB etches,
zero layer etch,
backside etch,
isotropic oxide etch,
non-critical polysilicon etch
Titanium/tantalum alloy etch.
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